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Descrizione qualitativa
Deposizione PVD di film sottili a partire da target sia ceramici che metallici tramite RF e DC magnetron sputtering, sputtering reattivo (N2 atmosphere).
Caratteristiche tecniche
Target diametro 3’’. 300W RF. 1,2 KW DC. Sample holder diam. 150mm
Campi di applicazione
Crescita di film sottili
Laboratorio: L04. Laboratorio di sintesi fisica di film sottili e nanoparticelle e caratterizzazione con spettroscopie elettroniche e a scansione
Responsabile: Paola Luches
Ubicazione: Piano Terra, Stanza: MO-17-00-075